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PhotoStress® method, software PhotoStress, isochromatic fringes, fringe order, reflection polariscopes.


The PhotoStress® method allows the determination of strains and stresses in the loaded and photoelastically coated structural members. The quantitative values of differences of the principal strains (stresses) and their directions can be used to obtain the field of strain or stress components on the whole coated surface using further experimental data. In order to accelerate the process of measurement in the point, along the line or on the surface a new software application PhotoStress was designed and developed  by the authors in collaboration with “Kybernetika, s.r.o.” company that allows to determine directions and magnitudes of differences of the principal strains or stresses on the basis of a photograph of photoelastically coated objects. The reflection polariscopes M030, M040 and LF/Z-2 with separation methods (the Slitting method, method of oblique incidence, method using a separative tensometer and method of shear stress differences) can be used in the measurement chain. The new program product for these applications, its short description and use are discussed in the present paper.


Acta Mechanica Slovaca. Volume 15, Issue 4, Pages 44 – 50, ISSN 1335-2393


  New Possibilities of using PhotoStress® Method


[1] Trebuňa, F., Šimčák, F., Handbook of Experimental Mechanics. TypoPress, Košice, 2007, 1526 s. ISBN 970-80-8073-816-7.

[2] Frankovský, P., Separation of principal stresses by the Slitting method. In: Winter Workshop of Applied Mechanics 2007: Prague, CTU, Czech Republic, February 16, 2007, ISBN 978-80-01-03710-2.
[3] Frankovský, P., The use of experimental methods of me  chanics for determination of residual stresses. Dissertation thesis, Košice, 2010.

[4] Trebuňa, F. et al., Abilities of New Software for PhotoStress Method. In: Experimentální analýza napětí 2010, Proceeding - 48th International Scientific Conference, Olomouc:Palacky University Olomouc, 2010, ISBN 978-80-244-2533-7.
[5] Patterson, A. E., Digital Photoelasticity: Principles, Practice and Potential. Strain, Volume 38, Issue 1, February 2002, Pages: 27–39, DOI: 10.1046/j.0039-2103.2002.00004.x
[6] Ramesh, K., Digital Photoelasticity - Advanced Techniques and Applications, Springer-Verlag, Berlin, Germany, 2000, ISBN: 3-540-66795-4.
[7] Ramesh, K., Photoelasticity. Sharpe (Ed.) Springer Handbook of experimental solid mechanics, Chapter on Photoelasticity. Springer, New York, U.S.A, 701–742, 2008.
[8] Kasimayan, T., Ramesh, K., Digital reflection photoelasticity using conventional reflection polariscope. Experimental Techniques, 2009, doi: 10.1111/j.1747–1567.2009.00537.x
[9] Kihara, T., An arctangent unwrapping technique of photoelasticity using linearly polarized light at three wavelengths. Strain, 39, pp. 65–71, 2003.
[10] Trebuňa, F. et al., Further Possibilities of Using Software PhotoStress for Separation of Principal Normal. In: Acta Mechanica Slovaca. Roč. 14, č. 2 (2010), s. 82-91.

ISSN 1335-2393
[11] Macura, P., Experimental Stress Analysis of Transducers by Means of PhotoStress Method. In: Acta Mechanica Slovaca. Roč. 14, č. 4 (2010), s. 52-57. ISSN 1335-2393

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ams 2 2016


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